Project description
Extreme ultraviolet (EUV) emission at 13.5 nm from tin plasma is essential for next-generation nanolithography in the semiconductor industry, but optimizing its conversion efficiency (CE) is challenging. Understanding how laser parameters, such as wavelength, pulse duration, and time structure, influence plasma dynamics and EUV yield is crucial for designing more efficient, compact, and robust EUV sources. This project aims to develop a 2D hydrodynamic-radiative model to simulate laser-tin interactions, taking into account laser absorption, plasma expansion, and EUV emission processes. This model will use experimental parameters as input and will be validated using yield and spectroscopic data.
Start date
Autumn 2026, or winter 2027
Supervision
Prof. François Vidal, INRS-Centre énergie matériaux télécommunications
Programs of study
Doctorat en sciences de l’énergie et des matériaux
Required qualifications
Good general background in physics, preferably in plasma physics and laser-matter interaction, and a strong interest in computer modeling of physical phenomena.
Scholarship
Financial support will be at least $26,280 per year, in accordance with INRS standards.
Location
Énergie Matériaux Télécommunications Research Centre
1650 Lionel-Boulet Blvd.
Varennes, Quebec J3X 1P7
How to Apply
If you are interested in the position, you can apply to François Vidal or by using the online form. Please include:
- a short cover letter indicating your interest
- detailed CV
- a copy of your transcripts
Questions
François Vidal
Email : francois.vidal@inrs.ca
Phone : 514 228-6918