Project description
Metal nitrides play a very important role in a wide variety of applications due to their exceptional properties such as high hardness and wear resistance, high melting point, high chemical stability, etc. Among the different processes that can be used to synthesize these materials, we are interested in sputtering and some of its variants. Our research project aims to correlate the properties of the plasma formed during this process with the properties of the resulting metal nitride thin films. The person we are looking for for this PhD project will work on numerical simulations based on molecular dynamics and density functional theory to achieve this goal. He/she will work in symbiosis with the experimental team, which will perform measurements on the plasma and on the synthesized metal nitride thin films.
Start date
Summer or autumn 2024, or winter 2025
Supervision
Prof. François Vidal, INRS-Énergie Matériaux Télécommunications Research Centre
Programs of study
Doctorat en sciences de l’énergie et des matériaux
Required qualifications
A good general background in physics, preferably in plasma physics and materials science, and a strong interest in computer modeling of physical phenomena.
Scholarship
Financial support will be at least $25,000 per year, in accordance with INRS standards.
Location
Énergie Matériaux Télécommunications Research Centre
1650 Lionel-Boulet Blvd.
Varennes, Quebec J3X 1P7
Questions
François Vidal
email : francois.vidal@inrs.ca
Téléphone : (514) 228-6918
How to Apply
If you are interested in the position, you can apply to François Vidal or by using the online form. Please include:
- a short cover letter indicating your interest
- detailed CV
- a copy of your transcripts